Web1 Oct 2024 · Impact of subthreshold hump on bulk-bias dependence of offset voltage variability in weak and moderate inversion regions Conference Paper Sep 2012 Kiyohiko … Web22 Sep 2011 · Semiconductor materials ABSTRACT A hump in the subthreshold regime of the transfer characteristics is reported for amorphous-indium-galium-zinc-oxide thin-film transistors (TFTs) when they are exposed to large positive gate bias-stress.
Comprehensive study on the TID effects of 0.13 - ScienceDirect
Web22 Sep 2011 · ABSTRACT. A hump in the subthreshold regime of the transfer characteristics is reported for amorphous-indium-galium-zinc-oxide thin-film transistors (TFTs) when they … Web1 Jul 2011 · The total ionizing dose radiation induced subthreshold leakage current increase and the hump effect under four different irradiation bias conditions including the worst case (ON bias) for the transistors are discussed. The high electric fields at the corners are partly responsible for the subthreshold hump effect. medieval spearhead
Comparison of TID response in core, input/output and high voltage …
Web23 Dec 2008 · The effect on the hump of interface states and oxide fixed charge, localized at the edge regions, is also analyzed and it is found that a degradation of the edge interfaces … There are two main causes for the abnormal hump behavior owing to the device driving stress. The first is the constant voltage/current driving stress applied at the gate electrode, which is similar in character to that of the pixel driving transistors in the OLED display. Figure 2 shows various I–V characteristics … See more To understand the anomalous hump phenomena in Figs 2 and 3, a 2D numerical TCAD Atlas simulation method was used to calculate the device characteristics. Figure 4a,b show the density of the states … See more In the evaluation of the device characteristics, it was found that the hump phenomenon occurs only when the defect state appears in a specific location with a specific energy. … See more Up to this point, the discussion has been centered on the generation or increase of the defect states in the density of states as the cause of the hump. The occurrence of the channel edge … See more Web1 Jun 2011 · The curve obtained after 200 krad (Si) exhibits significant leakage at Vgs < 0 V and subthreshold hump effect. At 500 krad (Si), the off-state leakage is approximately 5 orders of magnitude higher than the corresponding pre-irradiation value. Fig. 1b illustrates the pre- and post-irradiation I – V characteristics at different drain bias. nagaland university phd admission 2022